A method of forming devices is described. A substrate that has high gain (HG) device region to accommodate the HG transistor is disclosed. The device area of HG is used to form an HG gate. Sidewall spacers are included on the sides of the HG gate. The HG gate is situated in an area with significant levels of doping. The inner edges of these regions that are heavily doped are aligned to the outside edges of the sidewall spacers that form the HG gate. The regions that are heavily doped are HG source/drain (S/D) regions within the gate. The HG S/D regions do not contain halo or lightly doped drain regions.

Complementary Metal Oxide Semiconductor (CMOS) transistors are widely used. For example, CMOS transistors have been utilized in analog applications. Analog applications utilize the CMOS transistors which have high gains. It has been discovered that CMOStechnology is becoming more effective as it progresses to the nano-regime.

The present invention focuses on creating high-gain transistors within the nanotechnology range.

Embodiments generally relate to semiconductor devices, also known as integrated circuits (ICs). In one example, a method for making a device is explained. It is possible to provide an underlying substrate that has an area of high gain (HG) for a transistor that is an HG. A HG gate isformed on the substrate within the device region of HG. Spacers for sidewalls are incorporated into the sides of the HG gate. The heavily doped regions are located near the HG gate. Inner edges of the highly doped areas are aligned with the outer edges of the sidewall spaces of the HG gate. These regions are HG source/drain regions (S/D) of the gate HG. The HG S/D regions do not include lightly doped drain (LDD) regions, or halo regions.

A method of creating devices according to a different embodiment is also presented. This technique requires a substrate at least one device region for first transistors and one for second transistors. A first gate is formedon the first device region and the second gate is formed in the second device region. The gates include sidewall spacers on their sidewalls. They are situated in areas with significant levels of doping. The edges of these heavily doped areas are aligned with outer edges of sidewall spacers located at the gates. The heavily doped regions function as source/drain (S/D) regions in the gates. The S/D regions in the second transistor don’t include light doped drain (LDD) regions or Halo regions.

In yet another way the device is described. A substrate that has a high gain region (HG) to accommodate a transistor that is a HG is present in the device. A HG gate is disposed on the substrate within the HG device area. Sidewall spacers are included in the HG gate’s sidewalls. Heavily doped regions are disposed adjacent to the HG gate. The HG gate’s sidewall spacers are placed at the outer edges of the heavily doped regions. The regions that are heavily doped serve as HG source/drain (S/D)regions of the gate. The S/D regions in the HG gate don’t include lightly doped drain (LDD) regions or Halo regions.

These, as well as other advantages and advantages of the embodiments described herein are apparent with reference to the following description and the accompanying drawings. It is important to understand that the attributes that are described in various embodiments are not necessarily distinct. They are able to be combined and altered.

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Patents are granted by the government to safeguard an invention. It grants the inventor the right to develop, utilize and sell the invention. Society gains when new technology is brought for sale. Benefits can be realized in the direct sense, since it can allow individuals to achieve previously unattainable things. Or indirectly, through the economic opportunities (business growth and employment) that innovation provides.

A lot of pharmaceutical firms and university researchers are seeking patent protection for their research and developments. Patents can be granted to products, processes, or method of making new materials. Patent protection has to be granted to any invention that is valuable or novel and is not yet known by other people in the same field.

Patents give inventors a chance to be recognized for commercially viable inventions. They are an incentive to inventors to invent. Patents permit inventors and small businesses to be confident that there’s the possibility that they’ll receive a return on their time, effort and money spent on technology development. They can earn a living from their work.

Businesses with the ability to:

Secure new products and services that are innovative;

Your product will be more prominent appealing, valuable, and desirable to buyers.

Stand out and differentiate yourself and your product from others.

Access business and technical expertise and information;

Avoid the risk of using proprietary third-party content, or losing your valuable data, original outputs, or another creative output.

Patents transform inventor’s knowledge into a marketable asset, that opens new avenues to create jobs through licensing and joint ventures.

Investors who are involved in the commercialization and development of technology will appreciate small companies with patent protection appealing.

Patents can result in innovative ideas and inventions. This information can promote creativity and could be eligible for protection under patents.

Patents can be used as a deterrent to untrustworthy third parties that profit from an invention’s efforts.

Revenues from patent-protected technology that are commercially successful can be used to finance research and development (R&D) that will increase the chance of better technology in the near future.

It is possible to use intellectual property ownership to convince investors and lenders that your product has real commercial potential. Sometimes, one powerful patent can open the door to multiple financing opportunities. Patents as well as other IP assets can be used as collateral or security for financing debt. You can also show investors your patent assets to boost the value of your company. Forbes and others have noted that each patent can increase the value of your company by as much as $500,000 to $1 million.

A properly-designed business plan is vital for new businesses. It must be based on IP and demonstrate the way your product or service is distinct. Additionally, investors will be impressed when you show your IP rights are secure or on the verge of becoming secure and that they align with your business plan.

It is essential to keep your invention secret until you apply for patent protection. Public disclosure of an invention can be detrimental to its originality and invalidate it. Thus, disclosures that are filed prior to filing (e.g. for testing marketing, investors, or other business partners) must only be done after signing a confidentiality agreement.

There are many kinds of patents, and understanding them is essential to protecting your invention. Patents for utility are used to protect new processes and machine creations. Design patents cover ornamental designs. Utility patents are best to protect the proprietor from copycats and competitors. Most often the utility patent is issued for modifications or improvements to existing inventions. Utility patents also cover improvements and changes in existing inventions. A process patent will be a way to describe the actions or methods of performing a specific act. A chemical composition could be the combination of ingredients.

What is the length average of patents? Although utility patents last for 20 years from the date of their earliest filing, they can be extended through delay in the patent office.

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Patent searches are essential when you’re drafting a patent application. This allows you to discover different ideas and provide insights into their potential. This can help you limit the extent of your idea. Also, you can find out about the state of the art within your area of invention. This will help you to comprehend the scope of your invention and help prepare you for the filing of the patent application.

How to Search for Patents

The first step in obtaining your patent is to do the patent search. You can do a google patent search or do a USPTO search. Once the patent application has been filed, the item subject to the patent can be described as patent-pending. you can locate the patent application on public pair. Once the patent office has approved your application, you will be able to conduct a patent number look to find the patent issued. Your product will now be patentable. It is also possible to use the USPTO search engine. See below for details. For assistance, consult an attorney who specializes in patents. Patents granted in the United States are granted by the US trademark and patent office as well as the United States patent office. This office also evaluates trademark applications.

Are you interested in finding other similar patents? These are the steps to follow:

1. Brainstorm terms to describe your invention in relation to its intended, composition, or use.

Write down a brief detailed description of the invention. Be sure to avoid using terms that are generic such as “device,” “process,” and “system.” Instead, think about synonyms for the terms you chose initially. Also, keep track of significant technical terms and keywords.

Utilize the following questions to help you identify the keywords or concepts.

  • What is the purpose of the invention? Is it a utilitarian device or an ornamental design?
  • Is invention a way to make something or carry out a function? Or is it a thing or process?
  • What is the composition of the invention? What is the physical structure?
  • What is the goal of the invention?
  • What are the technical terms and terms used to describe an invention’s nature? A technical dictionary can assist you to identify the correct phrases.

2. These terms allow you to search for pertinent Cooperative Patent Classifications using the Classification Search Tool. To determine the best classification to your invention, scan the resulting classification’s class Schemes (class schedules). If you don’t get any results using the Classification Text Search, you might want to think about substituting the words that describe your invention using synonyms.

3. Review 3. Go over the CPC Classification Definition to verify the relevancy of the CPC classification that you have located. If the classification you have selected has a blue box with an “D” at its left, clicking on the hyperlink will take you to the CPC classification definition. CPC classification definitions will assist you in determining the classification’s scope , so you can select the one that is most appropriate. Additionally they can provide research tips and other suggestions which could be helpful for further research.

4. The Patents Full-Text Database and the Image Database allow you to find patent documents that are accompanied by the CPC classification. By focusing on the abstracts and representative drawings you can narrow your search to the most relevant patent publications.

5. This collection of patent publication is the best to check for connections with your invention. Pay close attention to the specification and claims. There are many patents available by referring to the patent examiner and the applicant.

6. Find patent applications published in the public domain using the CPC classification you chose in Step 3 in the Applications Full-Text and Image Database. It is also possible to use the same strategy of searching you used in Step 4 to narrow down your results to the most relevant patent applications by reviewing the abstracts and drawings for each page. The next step is to review every patent application that has been published with care and pay particular attention to the claims as well as other drawings.

7. Locate additional US patents by keyword search in AppFT or PatFT databases, classification searches of non-U.S. patents per below, and searching non-patent publications of inventions with web search engines. Here are a few examples:

  • Add keywords to your search. Keyword searches may turn up documents that are not well-categorized or have missed classifications during Step 2. For example, US patent examiners often supplement their classification searches with keyword searches. Think about the use of technical engineering terminology rather than everyday words.
  • Search for foreign patents using the CPC classification. Then, re-run the search using international patent office search engines such as Espacenet, the European Patent Office’s worldwide patent publication database of over 130 million patent publications. Other national databases include:
  • Search non-patent literature. Inventions can be made public in many non-patent publications. It is recommended that you search journals, books, websites, technical catalogs, conference proceedings, and other print and electronic publications.

To review your search, you can hire a registered patent attorney to assist. A preliminary search will help one better prepare to talk about their invention and other related inventions with a professional patent attorney. In addition, the attorney will not spend too much time or money on patenting basics.