APPLIED MATERIALS, INC. (Santa Clara, CA)

An autoteach enclosed system includes numerous surfaces that at least partially surround an internal volume. The autoteach enclosure features an autoteach feature that is at least partially located inside the internal volume. The autoteach feature is scanner-based device that is located in a fixed place within the autoteach enclosure system. Additionally, the autoteach system includes a front interface that connects to one or several of the many surfaces. This interface allows the autoteach system interface to a largely vertical section of a loading port from an electronic wafer processor. The autoteach pin is a device that allows the autoteach function of a robot arm that is part of the wafer processing system. The autoteach function is a method used to automatically teach the fixed location in the autoteach enclosure to the robot arm.

Platforms are utilized in semiconductor processing as well as other electronics processing. They employ robotic arms to move items (e.g. wafers) between processing chambers as well as storage areas (e.g. front open unified pods or FOUPs). A processing system, for instance, wafer processing systems, has at least one processing chamber that are used for processing wafers. Gas may be employed to etch the wafer within a processing chamber(e.g. the wafer can be etched when being electrostatically clamped into position within an etch chamber). Robotic arms may carry objects to certain locations.

This is a brief outline of the disclosure in order to give an overview of a few elements of the disclosure. This summary is not an extensive overview of the disclosure. This summary does not intend to highlight the most crucial elements of disclosure. The summary also doesn’t define the scope of any specific implementations or claims. It is intended to present a brief overview of the disclosure to serve as an introduction to the more thorough description to come later.

In an aspect of the disclosure an autoteach enclosure includes a plurality of surfaces that , at a minimum, form an interior volume of the autoteach enclosure. An autoteachpin is also included inside the enclosure for autoteaching. The autoteachpin is a scannable feature having an fixed location within the autoteach enclosure. Further, the autoteach system features a front interface which connects to one or more of the multiple surfaces. This interface permits the autoteach system interface with a largely vertical portion of a load port of the wafer processor system. The autoteach button facilitates the automatic instruction of an arm robot to the wafer processor.

In another aspect of the disclosure, an approach involves connecting an interface on the front of an autoteach enclosure system to an essentially vertical portion of a port for loading of a factory interface of a wafer processing system to create a sealed environment that includes an interior of the autoteach enclosure system and an internal area of the factory interface. Further, the method includes scanning an autoteachpin within the autoteach enclosuresystem’s interior volume using a robot arm. This ensures that the enclosure is completely sealed. The method further includes making a determination, based upon a result of the scanning of the pin, a fixed position that is associated to the autoteach enclosure system. Based on this fixed location, the robot arm will transfer the content.

Another aspect of the disclosure is that enclosure systems can include a plurality surfaces that at minimum partially cover an interior volume. An array of support structures are also included in the enclosure system. The enclosure system further includes the calibration substrate that is placed on the various support structures inside the inside volume. The calibration substrate also includes a calibration pin. The enclosure system furtherincludes an interface that connects to one or more of the multitude of surfaces. The front interface is designed to interface the enclosure system to the vertical part of a port for loading a wafer processing system. The calibrationsubstrate allows for the calibration of the robot arms of the wafer processor in order to automatically determine the robot arm error.

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